Modifications on illumination, distance function and Gabor masks for elastic bunch graph matching

Juan Carlos Gutierrez Caceres, Jose Rodrigo Galdos Chavez

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Face recognition is one of the most important field in computer vision, although there are many proposals and research papers still have limitations in real applications where uncontrolled conditions such as illumination, view angle, facial expressions, resolution and image quality, etc. are the main problems. To solve these issues there are a large number of methods for recognition, which can be grouped according to the approach by which the recognition process is addressed, such groups are; holistic methods and featrure based. In this paper we address a feature-based method called Elastic Bunch Graph Matching (EBGM) which is appropriate for an uncontrolled environment for its tolerance to changing background and certain variations of pose, also by having a lower sensitivity variations of illumination which is one of the weaknesses in the holistic methods, which compared to them EBGM without any modification obtained results alongside well-known methods as Principal Component Analysis (PCA). EBGM has several parameters that can be configured and most of the works in literature uses the default settings of the original author. In this respect this paper presents modifications to these parameters as regards the number of models, illumination enhancement in the preprocessing phase, the configurations Gabor masks and modifying the similarity function. Finally we corroborate the existence of improvements on our experimental results.

Original languageEnglish
Title of host publicationProceedings of the 2016 35th International Conference of the Chilean Computer Science Society, SCCC 2016
PublisherIEEE Computer Society
ISBN (Electronic)9781509033393
DOIs
StatePublished - 27 Jan 2017
Externally publishedYes
Event35th International Conference of the Chilean Computer Science Society, SCCC 2016 - Valparaiso, Chile
Duration: 10 Oct 201614 Oct 2016

Publication series

NameProceedings - International Conference of the Chilean Computer Science Society, SCCC
ISSN (Print)1522-4902

Conference

Conference35th International Conference of the Chilean Computer Science Society, SCCC 2016
Country/TerritoryChile
CityValparaiso
Period10/10/1614/10/16

Bibliographical note

Publisher Copyright:
© 2016 IEEE.

Keywords

  • biometrics
  • EBGM
  • Face recognition
  • Illumination
  • uncontrolled environment

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